Used AMAT / APPLIED MATERIALS Centura DPS II #139909 for sale

AMAT / APPLIED MATERIALS Centura DPS II reactor is an electron-beam physical vapor deposition (e-PVD) tool equipped with a 3-He capacity loadlock. This reactor is designed to provide advanced PVD processes with large uniform deposition rates over large wafer sizes. It features a configurable dual injector module capable of up to four simultaneous processes, enabling high-yield and throughput. The reactor's 4-inch in-situ source is available with a range of applications, including sputtering, multi-layer deposition and high-rate deposition of nano-structures compatible with all vacuum process techniques. AMAT Centura DPS II reactor is a high-vacuum equipment with an operating pressure of 1..5 x 10-5 Torr (2 mbar). It is equipped with an ultra-high-vacuum (UHV) linearly correctable ion getter system for improved substrate/substrate interfacial adhesion. This high-vacuum unit maintains consistent wafer temperature uniformity and homogeneity. APPLIED MATERIALS CENTURA DPS+ II also features a high-speed wafer rotation with dual speed ranges from 5 to 75 rpm and from 200 to 300 rpm. Centura DPS II reactor is equipped with a multi-zone heating machine for precise thermal control of the individual processes. This maintain a uniform process environment and improve uniformity of the deposition rate. The heater controls are compatible with various substrates, enabling high-precision processes over a wide range of deposition temperatures. Additionally, AMAT / APPLIED MATERIALS CENTURA DPS+ II provides a three-dimensional temperature profile measurement capability, which enables the user to minimize variation of the temperature profile. AMAT CENTURA DPS+ II features a unique wafer docking tool with a pre-load mechanism and a low-level motorized elevator. This guarantees precise and repeatable loading and unloading of the wafer without contamination. APPLIED MATERIALS Centura DPS II is also equipped with both on-board mechanical and cluster ports that provide easy integration with other deposition systems. CENTURA DPS+ II is a highly efficient and reliable tool, making it an ideal choice for a variety of PVD processes. It is capable of producing high-quality and uniform film layers and layers with sharp transitions, allowing for high yields in production.