Used AMAT / APPLIED MATERIALS Centura Epi #9215491 for sale

AMAT / APPLIED MATERIALS Centura Epi reactor is a vertical reactor used in semiconductor manufacturing. It is a deposition system that is used to produce thin films on the Silicon wafers used in the production of semiconductor chips. The Epi Reactor consists of three main components: the main chamber, the main carrier, and the secondary chamber. The main chamber is constructed from stainless steel and consists of two main sections: the top section where the wafers are placed, and the bottom section which houses the wafer-supporting carriers. The main carrier is a system of two carousels that run around the perimeter of the main chamber. This system allows for the deposition of multiple layers on the wafers as they travel around the chamber. The secondary chamber is fitted with dummy wafers used to ensure uniformity in the deposition of the deposited material. The Epi Reactor operates by creating a chemical vapor deposition (CVD) process. This process involves the positioning of a gas with a chemical precursor, such as silicon dopant gases or organics, inside the reactor. The gas is then heated to a temperature that is determined by the process. The heated gas reacts with the wafer, forming a thin film on its surface. The thickness of this film is dependent on the temperature of the process, the time the wafer spends in the reactor, and the chemical composition of the gases used. The Epi Reactor is a reliable tool for semiconductor production, allowing for fast and consistent deposition of thin layers. Its high temperature capability allows for the deposition of more complex layers, such as stack layers of different materials. The capability to precisely calibrate the deposition temperature and the ability to control the thickness of the layer allows for high yields and high quality of the layers, making it an essential part of semiconductor production. Thanks to its top-of-the-line safety features and its rigorous maintenance checks, the Epi Reactor remains one of the most reliable and efficient reactors in the semiconductor industry. Its straightforward design and simple user interface make it a cost effective solution for a range of production needs, and its high temperature capability allows it to be used in the deposition of some of the most advanced layer structures and materials.