Used AMAT / APPLIED MATERIALS CENTURA #9056487 for sale

AMAT / APPLIED MATERIALS CENTURA reactor is an advanced tool used in the semiconductor manufacturing industry, providing a sophisticated platform for etching, ion implantation, oxidation, and other essential processes. AMAT CENTURA is an advanced Wafer Etch Chamber, capable of a wide range of physical doping processes. Its design enables high-quality doping of wafers with different types of materials, such as arsenic, boron, phosphorus, and antimony. To perform the etching process, APPLIED MATERIALS CENTURA houses a high-voltage substrate holder, power supply, and gas deposition equipment, in addition to its plasma chamber. CENTURA's advanced design offers a large effective area and chucking capacity, allowing for high-throughput production. The chamber is also equipped with sophisticated software that allows for reliable parameter adjustments, real-time control of the etching process, and automatic cleaning. The chamber's advanced design and robust software provide a reliable and reliable platform for etching processes. The high-accuracy level of AMAT / APPLIED MATERIALS CENTURA system is maintained through an efficient thermal management unit, which ensures a high level of thermal stability throughout the entire etching process. AMAT CENTURA also features an Integrated Plasma Source that facilitates the efficient delivery of ionized gas molecules during etching to allow for precise etching of very thin layers. In addition to APPLIED MATERIALS CENTURA's advanced etching chambers, the machine is also equipped with a high-resolution plasma monitor that allows the user to make sure the etching process is running at a healthy level. CENTURA also features a comprehensive interface that provides instant feedback and control to the user, allowing them to monitor and adjust the etching process in real time. AMAT / APPLIED MATERIALS CENTURA is a highly advanced etching tool that combines precision, functionality, and reliability to provide industry-standard results. It is a reliable tool for etching, ion implantation, oxidation and other commonly used processes in the semiconductor manufacturing industry. Its ability to handle high volumes and its robust software platform provide reliable and accurate etching processes for industry-leading results.