Used AMAT / APPLIED MATERIALS CENTURA #9170824 for sale

AMAT / APPLIED MATERIALS CENTURA is an advanced plasma etch reactor used in industry and research applications in the semiconductor field. This reactor is a highly versatile low-cost alternative to traditional etching and deposition processes. It is capable of processing a wide range of materials and features a compact design for easy integration into a process line. AMAT CENTURA is equipped with advanced process control, providing reliable, repeatable processing results. The core components of the etch reactor include a vacuum chamber, RF power source, gas distribution equipment, and a heater platen. The vacuum chamber is constructed of stainless steel and is equipped with a variable pressure capability up to 10-7 Torr. The RF power source provides power levels up to 250 watts and is capable of running under both Pulse Mode and Crystal Controlled Operation. The gas distribution system accommodates up to 10 gas lines and two purge lines and is capable of both parallel and sequential gas flowes. The heater platen consists of a brass anodes and copper heaters, which allow for precise temperature control during etching and deposition processes. The most popular uses for APPLIED MATERIALS CENTURA etch reactor include Poly-Si module etch, SiN etch, Nitride etches, selective Si etch and oxide/nitride deposition. It is capable of processing a wide range of materials including Silicon, Gallium Arsenide (GaAs), Aluminum, Silicides, Boron Doped Silicon, Materials, and a variety of metals and plastics. CENTURA is capable of performing etch processes at temperatures ranging from -20°C to +250°C, allowing it to accommodate a range of different etch and deposition processes. AMAT / APPLIED MATERIALS CENTURA etch reactor also offers a variety of options including a touch screen monitor, integrated microwave / RF control unit, and a vision machine. This allows for precise control of the etch process and provides the ability to monitor and control the process parameters with great accuracy. Additionally, a vacuum interlock tool can be integrated with the reactor to guarantee safe and consistent results. Overall, AMAT CENTURA etch reactor is an extremely cost-effective, low maintenance, and versatile asset. Its compact design and advanced process control make it a great choice for etching and deposition processes in semiconductor industry applications. Its flexible temperature control, reliable results, and wide range of materials compatibility make it an ideal solution for many processes. APPLIED MATERIALS CENTURA provides a simple and effective way to perform a variety of etching and deposition operations in an efficiently and with precision.