Used AMAT / APPLIED MATERIALS P5000 Mark II #9081647 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a reactive ion etcher (RIE) - a type of plasma reactor used for the microfabrication of electronic components, particularly for the creation of nanoscale features. This tool enables the precise etching of thin film materials with very high resolution and excellent control over the plasma parameters. The main components of the system include a vacuum chamber, an antenna for generating a high-frequency radio waves, a reaction tube, a gas inlet and outlet, and a controller. AMAT P5000 Mark II utilizes radio frequency plasmas to generate reactive energetic species within the vacuum chamber. Reactive species produced in the plasma react with the gas molecules and are accelerated along the reaction tube by an electrical field created by the metal antenna. High-energy species directed towards the workpiece react with the surface and etch thin film materials. The tool is designed to be easily maintained and calibrated and has a monitor attached to the system to track key parameters including gas pressure, temperature and power. With an operating temperature range from 5 up to 80˚C and pressure range from 1.3 up to 1000 mTorr, APPLIED MATERIALS P 5000 MARK II is suitable for a wide range of materials and processes. The applied power, reaction chemistry and processing conditions can be optimized for different materials, enabling very high etch rates, excellent resolution and control of the nano-structure topography. The system also has a programmable auto-focus which can maintain a constant reaction pressure of up to 50 mTorr during etching. AMAT P 5000 MARK II is ideal for the microfabrication of electronic components, nanoscale features, and thin films with high-resolution, high-precision and excellent control over the plasma parameters. The tool is highly reliable and cost efficient, with improved productivity and repeatable performance.