Used AMAT / APPLIED MATERIALS P5000 #293621605 for sale

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ID: 293621605
Wafer Size: 6"
Vintage: 1995
CVD System, 6" Process gas: Nitride (2) Cambers 1995 vintage.
AMAT / APPLIED MATERIALS P5000 is a production-grade, multi-chamber reactor used for semiconductor processing. The reactor uses a modular design and offers superior uptime, availability, and repeatability. AMAT P-5000 reactor features an efficient chamber design that minimizes particle contamination, making it an ideal choice for production environments. The reactor has a gravity-assisted wafer transfer equipment, and provides superior superior gas flow optimization and chamber uniformity. The reactor has an advanced process control system with integrated sensors, controllers, and a user-friendly graphical user interface. The unit can be configured to support a variety of processes, including annealing, deposition, etching, and dryer stripping. The process control machine ensures precise uniformity and repeatability, reducing the number of times a process needs to be adjusted or re-set. APPLIED MATERIALS P 5000 reactor is built with a robust construction that produces uniform and repeatable results across a wide range of temperatures and pressures. The reactor is also equipped with multi-zone capability for thermal, optical, and electrical control. This functionality enables more precise process tuning and repeatable results across a wide temperature range. The reactor's modular design allows a variety of processes to be configured and integrated into a single tool. P-5000 is an industry-standard production-grade tool that can be used for many barriers of process. In addition, the asset is highly reliable and supports enhanced repeatability and uniformity, leading to lower process variation, less downtime, and improved yields.
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