Used AMAT / APPLIED MATERIALS P5000 #9052241 for sale

AMAT / APPLIED MATERIALS P5000 is a physical vapor deposition (PVD) reactor designed to assist with the manufacture of microelectronic devices. It is designed to deposit precise amounts of material onto a very small footprint, making it a valuable tool in semiconductor device fabrication. AMAT P-5000 enables the deposition of copper, aluminum, tungsten, gold, and other materials on substrates such as silicon and gallium arsenide. APPLIED MATERIALS P 5000 utilizes arc evaporation, or cathodic arc evaporation, for the deposition of material. This process involves highly energized anodes that emit an arc discharge, dislodging material from the anode's surface and causing it to become vaporized in a vacuum. This vapor is then directed toward the substrate, forming a very uniform deposit. The equipment is designed to accommodate the varying requirements of different substrates, and it is constantly monitored to ensure a uniform deposition rate. P-5000 accommodates up to four cathode targets, and can deposit multiple layers of materials in one chamber. It also utilizes a "side-multi" feature, which allows for deposition on both sides of a substrate, eliminating the need for a second chamber or additional tooling. The system also includes an in-situ 5-axis reciprocator, which can be used to rotate the substrate to enable uniform deposition in all directions. P 5000 is equipped with a load-lock unit, which enables output rates up to 7,000 wafers per hour. It is also able to accommodate substrates ranging from 25mm to 300mm in diameter. A proprietary auto-wafer tracker ensures that even substrates with irregular shapes can be deposited. APPLIED MATERIALS P5000 supports multiple sensor/monitoring/programmable logic control (PLC) methods, which maintain monitoring of process parameters in order to prevent issues with high-efficiency production. Some of the most popular process control technologies used are optical emission spectroscopy (OES), electro-chemical potentials (ECP), and temperature profiling. This machine also allows distant access and monitoring of online processes, which can help reduce downtime and improve productivity. In conclusion, AMAT / APPLIED MATERIALS P 5000 is a highly advanced and reliable PVD reactor designed to assist with the deposition of materials onto microelectronic substrates. Its precision, speed, and multiple process control methods make it a useful tool for semiconductor device fabrication.