Used AMAT / APPLIED MATERIALS P5000 #9054881 for sale

AMAT / APPLIED MATERIALS P5000 Reactor is a high-performance reactor designed for complex processes such as plasma etching, sputtering and depostion. It offers a wide range of capabilities and features, enabling the user to create complex structures and features with small features size, and to conduct a variety of experiments with great accuracy and control. AMAT P-5000 Reactor is based on a parallel-plate system, which allows areas of different sizes to be processed within the same chamber, eliminating non-uniformity. The reactor's configuration ensures optimal etch rates and uniformity across the entire surface. It is capable of handling samples of up to 300 mm in size, with dimensions that can be customized according to the user's needs. APPLIED MATERIALS P 5000 reactor is equipped with a high power source, enabling etching and deposition of multilayer materials. The source can provide up to 5000 Watts of power, allowing for processes of high throughput. The design of the reactor itself provides very good temperature uniformity and spatial uniformity, making it ideal for deposition processes. AMAT / APPLIED MATERIALS P-5000 Reactor is equipped with a variety of sensing, monitoring and control features. These features allow operators to monitor the pressure, temperature and VDF distribution, as well as other parameters such as the concentration of ICP gas, allowing them to control and adjust the process in real time. AMAT / APPLIED MATERIALS P 5000 Reactor is an incredibly versatile and comprehensive reactor capable of satisfying a broad range of user needs and experiment requirements. Its high precision and performance make it a great choice for users looking for maximum control over their experiments, as well as its suitability for high throughput applications.