Used AMAT / APPLIED MATERIALS P5000 #9056591 for sale

AMAT / APPLIED MATERIALS P5000 is a state-of-the-art plasma etching reactor designed specifically for semiconductor production. AMAT P-5000 offers higher throughput, faster wafer loading, improved safety features, and a longer chamber life than its predecessor, the P3000. APPLIED MATERIALS P 5000 is an advanced plasma etching reactor with a highly optimized electron cyclotron resonance (ECR) or inductively coupled plasma (ICP) source, offering superior etch rates and superior profiles for critical semiconductor processes. It is capable of reaching an etch rate of up to 250 nm/min, allowing for efficient throughput and shorter turnaround times on process cycles. P 5000 was designed with advanced safety features and superior exhaust systems that provide industry-leading protection to the environment. The dry-pumped equipment ensures continuous cleanliness of the exhaust efflux and allows for low fractional oxygen content in the chamber. The multi-level safety management system allows for a smooth and safe start up of the reactor. Furthermore, the window door features a safety interlock unit that prevents accidental exposure to low-pressure plasmas. APPLIED MATERIALS P-5000 offers superior wafer loading and handling capabilities. It features a fully automated robotic machine that allows for fast, reliable, and repeatable wafer loading and unloading. The robotic transfer arm eliminates harmful human exposure to the process chamber and its advanced controllers allow for precise alignment of wafers within the chamber. AMAT / APPLIED MATERIALS P 5000 reactor also offers a longer chamber life by using advanced materials and coatings, resulting in improved robustness and reduced maintenance requirements. The advanced materials employed are highly resistant to erosion, oxidation, and corrosion to ensure reliable etching processes and a long service life. In addition, AMAT P 5000 includes a high-efficiency cooling tool with water and nitrogen jets, which support high-power processes and superior temperature control. Overall, AMAT / APPLIED MATERIALS P-5000 is a versatile plasma etching reactor for semiconductor production, designed with superior safety features, optimized wafer loading and handling, and a longer chamber life. It offers higher throughput and faster process cycle times, making it the perfect solution for modern production requirements.