Used ULVAC Ceraus ZX-1000 #9025887 for sale

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ID: 9025887
Vintage: 2000
Metal PVD system, 8" Configured for: Al, Ti Not configured for: Mo (4) Process chambers: PVD Warehoused 2000 vintage.
ULVAC Ceraus ZX-1000 is a high performance sputtering equipment capable of producing precise and repeatable thin layers of material on virtually any substrate. Featuring four sources (three DC magnetron and one RF bias), the system is ideal for creating a wide range of thin-film material characteristics and provides excellent uniformity over large areas. This makes it particularly useful for ballistic research, compound semiconductor deposition, and thin-film optical coatings. ULVAC CERAUS ZX 1000 features a fully enclosed chamber which is designed to maintain a controlled environment for maximum sputtering performance and reproducibility. Its main components include four configurable ion sources, two sets of magnetrons, an RF oscillator, and an ability to sputter targets of various chemical compositions. It also offers other features like an automated software interface for controlling the substrate temperature, pressure, voltage, air flow, and substrate motion. Additionally, it can be adapted to use various gas control systems and high-performance control systems like Qtron-X. The power supplies in Ceraus ZX-1000 are highly reliable, which makes it capable of achieving outstanding material characteristics and thin layer deposition. Its advanced display also makes it much easier to monitor the sputtering process. It offers an outstanding sputtering yield and a wide range of operating parameters that can be easily adjusted to achieve the desired thin layer characteristics. The unit is designed to work with a variety of substrates, from crystals and thin films to polymers and metals. CERAUS ZX 1000 also features an advanced Rotary Magnetron which offers a much higher sputtering yield and uniformity than traditional magnetron sputtering systems. Furthermore, the machine offers a vacuum pumping tool which can be used to lower the pressure levels necessary for accurate thin film deposition. This allows for greater control over deposition speed and uniformity, while eliminating the need for a separate vacuum asset. Overall, ULVAC Ceraus ZX-1000 is an exceptional sputtering model capable of producing repeatable, accurate, and precise thin layers on virtually any substrate. Its advanced display and easy-to-use software interface make it an easy-to-use tool for any sputtering application. Its high yield, fast sputtering performance, and ability to work with a variety of substrates make it an ideal choice for various thin film product lines and research applications.
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