Used ULVAC SOLCIET #9053849 for sale

ULVAC SOLCIET reactors are a class of sputtering and plasma etching reactors. SOLCIET reactors utilize magnetically-enhanced sputtering and bessel-ion-source plasma etching technology to produce high quality films, nanostructures, and materials. This reactor provides excellent etching uniformity, ultimate processing flexibility, and almost 100% in-chamber ion-beam-induced plasma etching control. The sputtering process works by bombarding a target material with atoms or ions in order to coat a substrate with the desired material. In addition to being able to deposit materials onto a substrate, ULVAC SOLCIET reactors can also etch them away. This is accomplished through the Bessel-ion-source plasma etching process. The Bessel-ion-source technology utilizes a pulsed electromagnetic (EM) field to focus ions in order to efficiently etch away unwanted material. This technology also enables the operator to precisely control the amount and type of ions used during the etching process. SOLCIET reactors provide unprecedented levels of uniformity in etching due to their magnetic-field-technology-enhanced sputtering and Bessel-ion-source-plasma-etching processes. This is especially beneficial in applications that require precise etching, such as the production of nanostructures. The magnetic field used in ULVAC SOLCIET enables a more uniform distribution of charged particles over the entire substrate surface, resulting in greater etching uniformity. Furthermore, these reactors are also capable of providing nearly 100% in-chamber ion-beam-induced plasma etching control. Through the use of a powerful "neo-optic" lens, SOLCIET can focus the ion beam into a very small spot enabling very precise control over the etching process. This is particularly useful in small scale or high-precision applications. ULVAC SOLCIET is also praised for its tremendous flexibility. Its modular design allows for easy switching between various compatible ULVAC sputtering and plasma etching modules, allowing for tailor-made setups that are ideal for each application. This feature allows for performance optimization and cost-effectiveness. In all, SOLCIET is an excellent tool for the production of high quality films, nanostructures, and materials. Its robust technology, versatile design, and precision etching capabilities make it a promising trendsetter in the field of sputtering and plasma etching.