Used FEI DualBeam 835 #9160371 for sale
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ID: 9160371
Wafer Size: 8"
Dual beam Focused Ion Beam (FIB) system, 8"
Automated loadlock
Motorized rotary tilt stage: -5° to 55°
Magnum ion column for fibbing and searching
Ultra high resolution mode for SEM imaging
Gas injection:
Platinum
Delineation etcher
XeF2 Etcher
Operating voltage: 500 V to 30 kV.
FEI DualBeam 835 is a powerful ion milling system that combines a focused ion beam (FIB) and a scanning electron microscope (SEM). This system is used for imaging, nanofabrication, and materials analysis. The FIB sources a high-energy broad beam of ions which is then magnetically focused onto a sample. The sample is then milled using the ion beam, and the generated material can be analyzed with the SEM. The ions are accelerated between 10 to 70 kV, allowing a variety of milling strategies to be used which include sputtering, silicon etching, and fine etching. The system also features a variety of tools which can be used for the milling process, such as a gallium ion source, a gallium liquid metal ion gun, and a helium ion source. DualBeam 835 comes with a powerful motorized tiling stage that enables milling of samples up to 100mm in diameter. This stage is controlled by a tablet, allowing precision milling and easy alignment. It also features dual-in-plane electron imaging, which provides imaging of both topographical and compositional features. The integrated camera provides a resolution of up to 0.5 nanometers per pixel. FEI DualBeam 835 also features a variety of software packages for controlling the ion beam, processing data, and analyzing results. It is compatible with Windows, Linux, and Mac operating systems. DualBeam 835 offers a powerful combination of imaging, nanofabrication, and materials analysis for research and industrial applications. Its broad ion beam, powerful tiling stage, and high-resolution imaging capabilities enable its users to achieve nanoscale precision with ease.
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