Used AMAT / APPLIED MATERIALS 0010-01286 #9311052 for sale

AMAT / APPLIED MATERIALS 0010-01286 reactor is a power-packed hybrid pulsed-power/plasma deposition tool, specifically designed for semiconductor gate-dielectric and memory device film deposition applications. It is a highly reliable and efficient production-grade equipment that was developed with the most advanced pulsed DC magnetron sputter technology available. AMAT 0010-01286 reactor includes a 20 inch stainless steel chamber with a bell-jar-shaped, stainless flame-spray system, equipped with advanced heating, cooling and atmosphere control capabilities. The unit also provides an innovative Adaptive Layer Deposition (ALD) feature for simultaneous conformal thin-film and thin-channel deposition. The reactor also features an Allen Bradley PLC-based control machine to ensure reliable, repeatable and reproducible deposition results. Moreover, APPLIED MATERIALS 0010-01286 reactor includes a Substrate Source Generator which can precisely form and control the required substrate deposition temperature. The tool also includes a sophisticated Sputter Azimuth Control feature that can adjust the sputter pressure and angle of the process window. Additionally, 0010-01286 asset is equipped with advanced electron cyclotron resonance (ECR) plasma etching technology for superior surface-treatment of materials. The chamber is actively cooled by a nitrogen and a helium heating/cooling model, which ensures a uniform temperature and excellent thermal management. The cooling equipment works by drawing in the process gases from the substrate source and thruster chamber and circulating them around the chamber walls. This ensures that the processed material is not affected by thermal fluctuations that are inherent to conventional semiconductor processing. AMAT / APPLIED MATERIALS 0010-01286 system also features reliable process monitoring capabilities. It is equipped with a real-time, in-situ particle measurement module to accurately monitor the process and maintain tight control of the plasma chamber. Additionally, the unit offers minimally-invasive non-destructive end point control modules to accurately measure the end point of the deposition process. AMAT 0010-01286 machine delivers a consistent and repeatable process, which is essential for the manufacture of TiN gate dielectric and memory memory devices. APPLIED MATERIALS 0010-01286 reactor tool offers an efficient, reliable and power-efficient solution that meets the highest standards in today's semiconductor technology.