Used AMAT / APPLIED MATERIALS 0010-03254 #9309550 for sale

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AMAT / APPLIED MATERIALS 0010-03254
Sold
ID: 9309550
Wafer Size: 8"
MCA E-Chuck heater, 8".
AMAT / APPLIED MATERIALS 0010-03254 is a state-of-the-art chemical vapor deposition (CVD) reactor engineered for industry professionals in the semiconductor, optical and advanced ceramic industry. This tool is designed for maximum efficiency, safety and reliability when processing high purity and ultra-high purity layers of materials such as silicon, oxides and nitrides. It is capable of operating under working temperatures up to 1200°F. AMAT 0010-03254 utilizes a gas feed equipment that allows for a wide range of reactants. The tool supplies the substrate with reactants and also provides specific heating and controlling functions. For example, the temperature of the chip is precisely monitored and adjusted as needed in order to achieve the desired results. Other features include an RF generator, a power control and temperature control module, and an LCD display. The reactor is also equipped with a top-down direct-deposition system that ensures uniform layer thickness on the substrate. This unit is made of a high-quality quartz crystal cover that prevents oxidation and ensures consistent quality film layers. Additionally, the quartz crystal cover also helps reduce the risk of contaminant particles entering the machine. APPLIED MATERIALS 0010-03254 has a compact design, requiring minimal floor space. The tool is operated using one touch panel, simplifying programming and making it user friendly. It eliminates the need for external, specialized control systems. The reactor can be integrated with additional automated tools and provides linear and modular connectivity for optoelectronic processing. It also offers a chamber gas scrubber that maximizes the purity of the inlet gas distribution. Overall, 0010-03254 is an excellent choice for those looking for a reliable and efficient CVD reactor. It is designed for safe and efficient operation, allowing industry professionals to produce high-quality film layers for demanding applications. It is also an excellent option for those looking to reduce cost, save time, and take advantage of sophisticated technology.
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