Used AMAT / APPLIED MATERIALS 0010-36408 #9399533 for sale

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AMAT / APPLIED MATERIALS 0010-36408 is an advanced thermal chemical vapor deposition (CVD) reactor equipment designed for deposition of a wide range of materials. It is a single-wafer system with an advanced heating element for deposition of silicon-based materials in semiconductors, including polycrystalline silicon, low-pressure CVD silicon nitride and other advanced materials. The reactor has a 0.3, 0.6, or 1.0 μm susceptor, depending on the application. It is capable of deposition temperatures of up to 1100°C and is powered by a direct current power supply. This CVD reactor has a unique gas delivery unit, utilizing three different gas sources to provide ultra-precise, uniform delivery of deposition gases. It utilizes a multi-zone heating unit capable of heating each wafer to the desired temperature accurately and efficiently. It also has a tight process window, allowing for stable and repeatable results in the deposition of a variety of materials. AMAT 0010-36408 reactor also has a computer control interface, which allows for manual or automated operation of the machine. Using this interface, users can program deposition parameters to meet their specific applications needs, and can also monitor the progress of the wafer deposition. The interface also provides a variety of helpful diagnostic tools to help troubleshoot any issues. In addition to its advanced features, this CVD reactor also has an efficient cooling tool which prevents the susceptor from overheating during long-term operation. It also has a built-in purging asset to reduce the buildup of combustible gases, a vacuum plenum for low-pressure CVD and insulation shields to ensure the uniform distribution of heat energy across the wafer surface. Overall, APPLIED MATERIALS 0010-36408 thermal CVD reactor is an advanced model used for deposition of a wide range of materials in semiconductor applications. It provides highly repeatable results, while being easy to use and maintain. With its multiple gas sources and an intuitive interface, it is well suited for advanced thin film deposition processes.
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