Used EATON NOVA / AXCELIS NV GSD-HE #140297 for sale

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EATON NOVA / AXCELIS NV GSD-HE
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ID: 140297
Parts: RF resonator 1089350 Resonator DI PCB 1522270 Sparc workstations: sun1 and 2 Sliding seals kit: GSD 1045950 8" handler conversion kit (exec. Disk).
EATON NOVA / AXCELIS NV GSD-HE is a computer controlled ion implanter and monitor equipment designed to provide precision implanting of semiconductor devices with the highest levels of productivity and system uptime. It offers advanced technology designed to maximize implant yields and achieve the most efficient implantation process. AXCELIS NV GSD HE consists of several modules, including an Ion Source Driver, Beam Current Monitor, Gas Panel and Process Control Unit. This machine is designed to be used in conjunction with either AXCELIS High Current/High Energy (HC/HE) or EATON NOVA Low Current/High Energy (LC/HE) implantation platform. The Ion Source Driver is the heart of the tool and allows for precise control of the beam current, providing precise and stable implantation processes. This allows for precise reproducibility and low-level implant yields. The Beam Current Monitor guarantees the highest levels of stability and reliability while providing precise beam current monitoring. By monitoring the results of the implantation process, it allows for maximum levels of precision and repeatability. The gas panel allows for precise control of the gas flow, allowing for optimization of implantations. The Process Control Asset provides rapid and accurate control over the implantations, allowing for detailed data recording and control. EATON NOVA NV-GSD HE offers advanced functions, such as integrated failure analysis systems that allow the operator to quickly troubleshoot the source of any device failure, as well as sophisticated software tools to allow for precise control over the implantation process. With its sophisticated diagnostic capabilities, the model ensures that any problems that arise can be resolved quickly and efficiently. Overall, EATON NOVA NV-GSD-HE provides precise, reliable and repeatable implantation processes, and is an important factor in achieving precise, precise device manufacturing yields. It offers advanced functionality, as well as reliable and efficient operation, making it an essential element in any semiconductor equipment setup.
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