Used LAM RESEARCH Alliance A6 #9176367 for sale

LAM RESEARCH Alliance A6 is an etcher / asher, working on the principles of electron - cyclotron resonance (ECR) etching. The equipment is designed to meet stringent etching and ashing process requirements of a wide range of semiconductor materials. The A6 delivers superior etching and ashing performance, as well as low maintenance costs and minimal downtime. The system features an all-N-type ECR etching process chamber, equipped with a helium gas injectors and an ion source. The high-energy resonance method used by the A6 enables high etch rate and superior selectivity, even at the sub-half micron levels. The helium gas injectors allow for low deposition, excellent selectivity, and fast etch rates. The ion source generates a high-energy beam of ions to rapidly remove the material from the substrate, allowing for efficient etching and ashing processes. The unit is integrated with a high-glide-rate plasma-cleaning module to safely and reliably clean the process chamber of the A6. This module increases plasma density, enhances etch and ashing processes, and improves overall process repeatability. A high-capacity gas-supply machine provides thermal control and the highest level of contamination prevention. Advanced real-time three-way flow-control chambers allow for precise control of etch processes. Additionally, a proprietary load-lock tool ensures high-precision recipes and uniformity. The asset features an automated recipe-management model to facilitate the transfer of recipes between chambers with little effort. Customized AI predictive recipes offers optimum process performance on every substrate and process combination. The equipment also provides the user with real-time status information and control, to enhance process monitoring and troubleshooting. The optional Air-to-Process Interface reduces downtime for job sequencing, thereby increasing process throughput. The system also provides high accuracy and repeatability, even when processing substrates with varying thicknesses. The A6 also offers flexibility, allowing for different etching techniques such as Isotropic, Anisotropic, and Directional etching. Alliance A6 is a powerful tool for high-performance etching and ashing of semiconductor materials. It provides reliable etching performance, together with safe and low maintenance. The A6 offers the latest in etching and ashing technologies and allows for customized process recipes to enhance efficiency and repeatability. Overall, LAM RESEARCH Alliance A6 is a powerful etching and ashing unit that offers superior etching performance without compromising safety.