Used VARIAN E1000 #158184 for sale

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ID: 158184
Implanter chamber control rack Components: § Varian Plasma Flood and Bias Supply § Kollmorgen DC Brushless Amplifier BDS3-230/55-28-220 § Kollmorgen Power Supply PSR3-230/50-07-003 § (3) Infranor Resolver SMTBS § Varian 112729001 § Varian 113136001 § Mavilor Motors SE0718-07057 § MKS Baratron 122AA-00010DB § Brooks 5850E Mass Flow Controller 9408HC034101 Top works for the gate valves not included As is.
VARIAN E1000 is a complete ion implantation and monitoring equipment that is used to produce ultra-high purity, precise and consistent dopant profiles in the manufacture of semiconductor devices. VARIAN E-1000 system offers comprehensive flexibility to develop, select, and optimize ion implantation profiles to support today's increasingly complex fabrication processes. It combines advanced beamline power and source technology with a powerful control unit and high resolution product feedback. E 1000's enhanced beamline power and source configuration produces high speed performance with high beam current and particle uniformity. A programmable high voltage power supply with autocalibration ensures superior process control and repeatability, while the beamline-mapping technology accounts for angular distributions to ensure accurate, repeatable beam accuracy. High resolution ion beam profiling sensors enable precise monitoring of implant profiles for process optimization. E1000's comprehensive control machine offers automation and efficient data handling capabilities, allowing for easy process development, setup and optimization. Utilizing a real-time control tool, VARIAN E 1000 performs beam modulation, beam arching and other adaptive, dynamic control functions to optimize beam performance. In addition, E-1000's advanced multiplexing capabilities enable simultaneous implants of various species with uniform doses and energies. VARIAN E1000's high resolution product feedback ensures reliable, consistent product quality. Its high-resolution product feedback systems help to identify implant profile issues and other parameters. In addition, VARIAN E-1000's advanced process monitoring software allows operators to monitor, diagnose and troubleshoot beam-process issues in real time, allowing for process optimization and improved uptime. E 1000 is designed for flexible, precise and reliable ion implantation. Its robust feature set, integrated control asset and high resolution product feedback combine to provide superior throughput, repeatability and product quality for the most demanding applications.
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