Used AIRCO TEMESCAL VES 2550 #166774 for sale
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ID: 166774
Electron Beam Evaporation System
25.5-inch diameter x 12-inch high stainless steel, water-cooled deposition chamber designed for waist high substrate loading and unloading
25.5-inch diameter x 20 inch high stainless steel, evaporation source chamber with model VV-400 View Vac view port with Teflon film
CTI 400 On-Board cryogenic pump
CTI 9600 Helium compressor
Mechanical vacuum pump
Auto / manual vacuum valve sequence controller
Ionization gauge and thermocouple gauge controller
Inficon IC6000 Auto/Manual Deposition rate / process controller
CV-14, 14kW electron beam power supply with X-Y beam sweep controller
Temescal Four (4) pocket electron beam gun with crucible indexer
Source shutter assembly fully integrated with deposition controller
Substrate tooling for Lift-off deposition process
System manuals
Optional: Neslab HX350 air cooled water chiller / recurculator
1991 vintage.
AIRCO TEMESCAL VES 2550 is a dedicated sputtering equipment designed for optimal film deposition. The system has two magnetron cathodes and two aluminum disc targets which can be run independently of each other, allowing for the concurrent deposition of both evaporated and sputtered materials. The unit also has a variable frequency power supply to control the power output of the magnetron cathodes, as well as a three phase variable power supply for the disc targets. Additionally, the TEMESCAL comes equipped with a gas panel that allows the user to precisely control the flow rate and mix of various reactive and non-reactive gases. Furthermore, the machine features a high precision turntable with a unique nozzle design. This design allows for a uniform deposition across the substrate being coated. The tool is also equipped with a high stability ion source that enables control of the flux and energy at the substrate; as well as a powered substrate shuttle arm with adjustable height to allow for easy access to the substrates. AIRCO TEMESCAL VES-2550 also has a high tech, easy to use control panel which allows for precise control of target temperature, substrate temperature, ion flux, power output, and deposition rate. It is also compatible with a variety of cameras and imaging systems, allowing the user to monitor and analyze the process in real time. Moreover, the TEMESCAL is designed to be efficient, with a low power consumption and minimal emissions. In conclusion, VES 2550 is an excellent dedicated sputtering asset for optimal film deposition. It is equipped with state of the art features that allow for precise control and analysis of the deposition process, while keeping power and emissions to a minimum. This makes it the perfect choice for any application requiring the deposition of thin films.
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