Used AMAT / APPLIED MATERIALS Centura PVD #9244066 for sale

AMAT / APPLIED MATERIALS Centura PVD Reactor is a high-efficiency plasma-based thin-film deposition equipment designed for the application of high-quality multilayer thin-film coatings. AMAT Centura PVD Reactor produces a highly uniform, ultra-thin film coating with excellent barrier properties, making it ideal for applications such as optical coatings and protective coatings for electronic devices. The reactor uses a multi-headed, DC-discharge plasma source for metal-ion source introduction and a cylindrical plasma chamber for deposition. The chamber is designed in a concentric pattern with a positive and negative power supply located at the bottom and the uppermost portion, respectively. The reactive gases used in the reactor are hydrogen, argon, xenon, neon and sulfur hexafluoride. The reactor utilizes an advanced plasma-based deposition technique known as "sputter-evaporation," wherein energetic ions (typically argon or xenon) are energized by a high-voltage power source. The energized ions are then directed to the substrate deposited on the substrate plate located at the bottom of the reactor. The energetic ions dislodge the deposited material, which is then sputtered along the walls of the plasma chamber. Upon reaching the substrate, the materials undergo chemical reactions and form a thin-film coating. APPLIED MATERIALS Centura PVD Reactor uses a number of technologies to ensure excellent and reliable results. The "floating substrate" technique produces uniform deposition rates of films even across large areas. The Centura utilizes an innovative "linear direct current" (LDC) source to deliver consistent plasma density. The reactor is able to achieve highly precise temperature control and uniform film thicknesses, even across complex shapes. The system also features an array of automated gas management and predictive health monitoring capabilities, which keep the unit running safely and efficiently. In conclusion, Centura PVD Reactor is a high-precision thin-film deposition machine designed for the production of highly uniform, multi-layer films. In addition to outstanding barrier properties and uniform film thicknesses, AMAT / APPLIED MATERIALS Centura PVD Reactor utilizes multiple technologies to ensure reliable results and high-quality film deposition.