Used AMAT / APPLIED MATERIALS Centura PVD #9244068 for sale

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AMAT / APPLIED MATERIALS Centura PVD
Sold
ID: 9244068
Wafer Size: 8"
Vintage: 1996
Sputtering system, 8" 1996 vintage.
AMAT/AMAT / APPLIED MATERIALS Centura PVD (Physical Vapor Deposition) reactor is an industrial tool used for the deposition of thin films and coatings. The equipment is composed of a vacuum chamber, an electron beam gun, a magnetic field generator, a gas distribution system, and heating and cooling elements. AMAT Centura PVD reactor operates in a vacuum chamber to ensure the quality of the deposition process, which is essential to the creation of thin films or coatings. Inside the vacuum chamber, an electron beam gun, also known as a source, is used to direct electrons onto a cathode in the center of the chamber. This causes atoms or molecules of a target material, called the sputtering gas, to ions, enabling them to be drifted across the chamber and strike the substrate or target material. In order to ensure the correct collimation of the sputtered ions, a magnetic field is generated and is used to guide the ions from the sputtering gas towards the substrate. The deposited films and coatings also require precise heating and cooling elements. During the process, a gas distribution unit is used to ensure the accurate diffusion of many different gases within the reactor. Various gases, such as argon, oxygen, and nitrogen, are used for different types of films and coatings. Depending on the nature of the films or coatings that require sputtering, additional gases can also be used to achieve specific results. For example, if coatings with a low level of wear are required, a greater quantity of argon gas is used to reduce the oxygen concentration inside the chamber and help pure and uniform sputtering. Overall, APPLIED MATERIALS/APPLIED MATERIALS Centura PVD reactor is an extremely versatile machine that can be used for many different types of film and coating applications. By optimizing different parameters, such as gas composition, substrate temperature, and substrate position, a wide variety of materials can be deposited in order to yield a range of desired characteristics. The tool is efficient, reliable, and cost-effective, making it a popular solution for a variety of thin film and coating applications.
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