Used AMAT / APPLIED MATERIALS Endura PVD #9213370 for sale

AMAT / APPLIED MATERIALS Endura PVD
ID: 9213370
Sputtering system.
AMAT Inc. Endura Physical Vapor Deposition (PVD) reactor is a multi-chamber tool set designed to enable precise deposition of a variety of thin film materials. AMAT / APPLIED MATERIALS Endura PVD equipment is amenable for use in a wide range of applications, including fabrication of electronic components and interconnects, optoelectronic devices, vibrating MEMS devices, and advanced photovoltaic cells. The system is modular, allowing for different configurations to fit various process requirements. AMAT Endura PVD unit is built around a central cluster of single or double-chamber machine configuration. Each chamber includes a PVD source, such as a trimethylaluminum (TMA) bipolar source, electrons cyclotron resonance source, iron-bridge magnetron source, or an ionized-cluster beam source. The source is then sequentially brought up to an operating temperature, with a closed loop thermal control tool maintaining precise temperature stability for the duration of the deposition process. The chamber is then evacuated using a high-performance turbo pumping asset with a wide range of pumping speeds. The chambers are designed to provide high-precision flux control of the incoming source materials, enabling very uniform thin film deposition. Process control is also available in APPLIED MATERIALS Endura PVD systems, allowing for precise monitoring of film thickness in situ. Actuators and motion controllers are also available, allowing deposition over a wide range of substrate shapes and sizes. In addition, Endura PVD systems can be equipped with sophisticated in-line metrology capabilities, including X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). AMAT / APPLIED MATERIALS Endura PVD model is also designed to facilitate high-throughput performance, with high reproducibility of deposition recipes and processes. Fast tool exchange, quick process wafers scanning, and fast warm up time ensures the smooth production of critical applications. The tool set is also designed to ensure high-end results in terms of substrate compatibility, highest temperature uniformity, and absence of 'edge effect'. All combined, AMAT Endura PVD equipment offers a versatile and precise deposition technology that can be configured to support the fabrication of high-density, low-cost, and high-performance thin-film products and components, enabling customers to stay competitive in the ever-changing technology landscape.
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