Used AMAT / APPLIED MATERIALS P5000 Mark II #9080130 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a high-performance etching reactor for the most demanding etching applications. This reactor boasts a wide range of capabilities including depletion and enrichment etching, ion-assisted etching, physical vapor deposition (PVD) and reactive ion etching (RIE) processes. With a patented VHF magnetron source, and the ability to achieve a plasma density of up to 5 x 1012 cm-3, this reactor has the power required to ensure top-notch results. AMAT P5000 Mark II offers excellent substrate temperature control, with a temperature range of -25℃ to 75℃ and a tolerance of ±1℃ for a temperature range of up to 300℃. It also features a highly efficient source mover for optimal source placement and uniformly excellent etching across all substrates. Its magnetron design optimizes the ratios between ion flux, ion energy, and source power, to ensure high etch rates, low substrate damage, and optimum uniformity. The modular design of APPLIED MATERIALS P 5000 MARK II ensures both flexibility and upgradability, allowing users to seamlessly install upgrade modules, such as the optional remote wafer fore-vacuum system. This system allows multiple wafers to be processed without interruption, ensuring a highly efficient etching process. The design also enables parasitic etching to be controlled and avoided by adjusting the process parameters. AMAT / APPLIED MATERIALS P 5000 MARK II is equipped with a high-precision controller, tailored to exacting process requirements. With a patented adaptive chamber technology, the controller achieves higher precision, better uniformity and wider process window. Settings are easily configured with the intuitive touch screen interface. Additionally, the controller can be interconnected to various workcell systems for ultimate control and efficiency. Finally, this reactor has been designed for improved safety. Its durability and protection features satisfy the highest safety requirements, ensuring compliant operation. On the outside, P5000 Mark II features low-level safety covers, integrated safety signs and signals, and a chamber-protection layer of non-magnetic stainless steel. In short, APPLIED MATERIALS P5000 Mark II is an incredibly advanced etching reactor for the ultimate in etching performance. It offers unmatched precision, reliability and safety to ensure consistent and top-quality results.