Used CANON / ANELVA ILC 1012 #9103093 for sale

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CANON / ANELVA ILC 1012
Sold
ID: 9103093
Wafer Size: 6"
Sputtering systems, 6".
CANON / ANELVA ILC 1012 is a high performance, multi-functional sputtering equipment that is ideal for use in semiconductor and thin-film device manufacturing. It consists of a high power brushless sputtering system with RF capacitancely coupled with a high power, diode-placed and computer-controlled xenon-ion showerhead. The unit was designed to provide improved coatings, higher rates of film deposition, and uniformity across substrates of different sizes and shapes. CANON ILC 1012 provides an anode-free vacuum environment with a uniform electric field of up to 470V. This ensures the highest quality of film deposition, even on non-conductive substrates. The machine also incorporates a bubble-free chamber to minimizing contamination, ensuring product uniformity. To further improve film uniformity, an integrated feature allows for the integration of an inverted design shutter with a chamber target mask to optimize the deposition rate of the substrate-target surface. The tool can combine up to 8 targets including aluminum, chromium and tantalum at once, making it highly versatile for multi-level applications. The asset also offers adjustable power ranging from 10 to 550 watts for each target, making it ideal for different types of deposition processes. Additionally, the model has an automated process model that can recognize and eliminate any deviations, enabling superior control over film thickness and uniformity. ANELVA ILC 1012 also includes a control software package for easy data acquisition and process control as well as an intelligence auto-adjust function can dynamically control the sputter process to maintain a constant thickness of deposited film. Moreover, the equipment features a user-friendly interface and is equipped with a water-cooled RF generator, along with the necessary safety equipment and seals. Overall, ILC 1012 sputtering system provides a high-quality coating with reduced costs and improved process control, making it a great choice for applications in the semiconductor and thin-film device industries.
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