Used CANON / ANELVA ILC 1013MK2 #9119670 for sale

CANON / ANELVA ILC 1013MK2 is a medium-sized DC sputtering equipment ideally suited for thin film deposition applications. It is an integrated, highly automated sputter deposition tool with a modular design for easy maintenance. The system is equipped with a high power, powerful DC magnetron sputter gun and is capable of sputter-depositing thin films onto flat, curved, or patterned surfaces. The unit is designed for simplified maintenance and operation, allowing for consistent, repeatable results. CANON ILC 1013MK2 offers a comprehensive feature set, including a separate control unit, automatic process control, an eight-bay chamber, and two working chambers. The main chamber offers three sputter cathodes for simultaneous sputtering of different materials, enabling users to achieve optimal sputtering parameters for their specific substrate and films. The circular field of manipulation of the sputter gun is adjustable to provide maximum homogeneity of deposition. The area of magnetic material that the gun passes over is 360°, enabling the user to have full control over the area. The control unit offers easy to use graphical user interface (GUI) to control the sputter deposition process. It is equipped with a Multi-Channel Raster Positioner with customized motion profile control and high precision position readout. This ensures optimal performance in terms of homogeneity, uniformity and repeatability of results. The deposition parameters such as sputtering power, substrate temperature, chamber pressure, and process duration can be accurately programmed and monitored through the control unit. ANELVA ILC 1013MK2 is also equipped with multiple features for process integrity control, such as overpressure and oxygen monitoring, pre-gas cleaning, and a particle-counter for monitoring film mass. Its two working chambers provide additional flexibility for substrate and film deposition, providing the capability for single-step or stacked-step process. This sputter deposition machine is a optimal choice for thin film research, development, and quality control applications.