Used CANON / ANELVA ILC 1051 #9043718 for sale

CANON / ANELVA ILC 1051 is a high-performance sputtering equipment designed to provide precise control of the process parameters, allowing the user to have complete control over the deposition rates. Sputtering is the process of using a plasma source to transfer atoms onto a substrate, resulting in a thin film layer deposited on the substrate surface. CANON ILC 1051 system features a main board computer for easy setup and maintenance, high-voltage controllable DC power, and a frequency-controlled turbomolecular pump. Additionally, the unit includes an independent gas flow controller, vacuum gauge, rotatable stage, sealable vacuum chamber and remote-controlled sample holder. With the rotatable stage, an operator can use one sputtering process for up to four substrates, and can independently adjust the angle for each process. The machine features a powerful RF power supply that controls the parameters of sputtering deposition with up to 64 programmable steps, allowing the user to specify the pre-sputtering process, deposition time, and post-sputtering time. Additionally, the DC power supply allows for precise and reproducible sputtering rates which enable the user to accurately control the deposition parameters. ANELVA ILC-1051 has an integrated company monitoring tool with its own software for monitoring the sputtering processes, ensuring the efficient operations of the sputter asset as well as tracking and archiving deposition recipes. ILC 1051 offers significant throughput for its user, ensuring a faster process by i) maintaining a uniform distribution of the deposited films, ii) minimizing recoating time and iii) refining of the process cycles. Furthermore, ANELVA ILC 1051 is equipped with an automatic wafer alignment model, enhancing precision and accuracy, as well as reducing workload for the operator. Overall, CANON ILC-1051 sputtering equipment ensures precise, controlled, and reproducible sputtering, enabling an operator to accurately fabricate samples with thin films of metals, dielectrics, and other materials.