Used CANON / ANELVA ILC 1051 #9151423 for sale

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CANON / ANELVA ILC 1051
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ID: 9151423
Sputtering systems.
CANON / ANELVA ILC 1051 is a plasma sputter deposition equipment designed for use in research and industrial applications. It utilizes magnetron sputtering technology, which is a process in which an electric current is passed through a plasma to bombard a target, which releases ions that deposit onto the substrate. This system is designed for maximum precision and uniformity in the deposition of thin films, and is capable of handling a variety of materials, including metals, dielectrics, and ceramics. CANON ILC 1051 features a precise four-axis design that allows for efficient control over the substrate to target angle. It also includes advanced temperature control for uniform thermal management of the substrate, and a low-pressure sputtering chamber to reduce sputtered atoms to a minimum. ANELVA ILC-1051 can be configured with up to four sources of DC or RF sputtering, allowing it to sputter a larger area with greater uniformity. The entire unit is controlled via a graphical user interface, allowing users to quickly set up and monitor the machine. ILC 1051 offers a variety of features to help users produce high-quality sputtering results. The tool includes automatic pressure and temperature control, as well as systems for monitoring oxygen and other reactive gases. Additionally, the asset features a high-power pumping model that maintains a clean and low-pressure environment in the deposition chamber. There is a data logging equipment to monitor all parameters, and the system can perform other tasks such as etching and coating. Overall, ANELVA ILC 1051 is an ideal choice for research and industrial applications that require precise sputter deposition of thin films. Its advanced features, such as temperature control, low-pressure chamber, and user-friendly interface make it a great choice for sputtering high-quality films on a variety of materials. Its four-axis design allows for efficient control over the substrate to target angle and provides uniformity in the deposition process. CANON / ANELVA ILC-1051 can handle a wide range of materials, and its precise design and advanced features guarantee reliable and high-quality thin-film deposition.
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