Used CANON / ANELVA ILC 1060 #9287391 for sale

CANON / ANELVA ILC 1060 is an industrial sputtering equipment for etching and coating the surfaces of various materials. The equipment supports reactive ion etching (RIE) and magnetron sputtering, and operates in both manual and automated modes. The self-contained system includes a controller, an etching chamber, a target chamber, and an independent remote plasma source. The controller allows for precise control and monitoring of various parameters including pressure, flow rates, temperature, current, voltage, and target power. The etching chamber has a maximum internal volume of 290 liters and contains a Turbo-Pumped Confined Space Unit (TCSU). It is equipped with a two-stage mechanical scroll pump, turbomolecular pumping unit, and ion beam source. The turbo-molecular pumping machine is used to evacuate the chamber and create the desired vacuum state. The ion beam source is used to produce the desired etching plasma. The target chamber supports single- or multilayer sputtering, with a target area capacity of up to 200 mm. The chamber is fitted with a diaphragm pump and easy-to-clean target mount, as well as adjustable plasma screening technology to control ion energy and direction. The chamber also features on-board gas control with five separate gas inlets and automated valve control. The tool's independent remote plasma source allows for bi-polar etching, and can be configured to either a microwave-excited or a DC-excited configuration. It is equipped with a junction box and gas handling asset, allowing precise and repeatable process control. CANON ILC 1060 has a rating of 75 kW, and support multiple configurations including planar, slot, and crossfield. It is suited for applications in the research, semiconductor, and high-volume production markets. The model has built-in safety features, interlocks, and can be integrated with other CANON or ANELVA systems.