Used CANON / ANELVA SBH 2306DE #155740 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 155740
Wafer Size: 4"
Vintage: 1993
Sputtering system, 4", 1993 vintage.
CANON / ANELVA SBH 2306DE is a sputtering equipment designed for ultra-thin film fabrication, making it an ideal tool for research and development. This system is equipped with three magnetron cathodes with up to three targets which can be sputtered simultaneously. It utilizes a unique RF sputtering method for forming high-quality thin films with low particulate counts. The arrangement of the anode and cathode enables higher deposition rates and a longer lifespan of the sputtering sources. This unit features a temperature-controlled substrate stage to allow for high quality deposition in a wide range of temperatures. CANON SBH 2306DE can be used for many deposition processes, such as the fabrication of various types of displays. It is capable of producing amorphous silicon and other thin films for optoelectronic semiconductor applications, such as solar cells and OLED displays. The machine is also suitable for producing multilayer optical interference filters, conducting and insulating films, and other advanced thin film designs. The tool is designed with a variable pressure chamber and a temperature-controlled substrate holder, which are both held in a vacuum chamber to minimize contaminant particles during the deposition process. Furthermore, the asset provides an adjustable negative pressure in the reaction chamber, enabling the deposition of high-quality thin films. In addition, ANELVA SBH 2306DE uses automatic, high frequency, pulse power to maintain exchangeable plasma density and power. Its Differential Pressure Control Model ensures minimal equipment downtime, as it eliminates the need for periodic manual maintenance. The system is equipped with an integrated process monitor and real-time data logging capabilities to monitor deposition process parameters, display the built-in control panel and record various parameters for the purposes of diagnostics. The advanced programmable logic controller (PLC) promotes user-friendly operation of the unit and maximizes the sputtering machine's accuracy and reproducibility. In conclusion, SBH 2306DE is a sputtering tool that is ideal for thin film fabrication research, development and production. It offers excellent thin film quality and precision with advanced control and data logging capabilities, helping to ensure successful film fabrication. This asset is equipped with an adjustable pressure chamber, variable temperature substrate holder and pulse power controller, which all contribute to an efficient, consistent and reliable sputtering.
There are no reviews yet