Used CANON / ANELVA SPF-710H #157670 for sale

CANON / ANELVA SPF-710H is a high-end analytical sputtering equipment that is used in thin film deposition and metalization processes. It is designed for use in production and large-scale research and development applications. The system consists of various components, including a sputter source, substrate heater, drive assembly, vacuum chamber, control panel, and exhaust unit. CANON SPF-710H sputter source features a low-pressure chamber and a tungsten target. Unlike traditional sputter sources which use a radio-frequency (RF) glow discharge to vaporize the target, ANELVA SPF-710H uses a direct-current (DC) bias voltage to facilitate ion sputtering. This improves the emission uniformity and the rate of sputtering. The substrate heater is designed to maintain the temperature of the substrate during deposition, while the drive assembly provides precise control over positioning and substrate movement. The vacuum chamber of SPF-710H is constructed of high-grade stainless steel, and features a large spacious area for substrates up to 8 inches in size. A powerful vacuum pump, coupled with a noble gas delivery machine, maintains a high degree of vacuum in the chamber. This allows for fast and efficient thin film deposition. The control panel of CANON / ANELVA SPF-710H is highly sophisticated and provides the user with precision control over the various functions and parameters of the tool. It includes an intuitive graphical interface and is pre-programmed with commonly used operating conditions. Additionally, it includes various safety features to protect the user from hazardous gases and electrical shock. Finally, CANON SPF-710H includes a powerful exhaust asset to quickly and efficiently evacuate sputtered particles and gases. This is especially critical in high-vacuum deposition processes, as it helps reduce contamination and maintains a safe and healthy working environment. In summary, ANELVA SPF-710H is a comprehensive, high-end analytical sputtering model that is suitable for a wide range of thin film deposition and metalization applications. Its sophisticated components, including a sputter source, substrate heater, drive assembly, and control panel, provide a robust platform for reliable and efficient operation. Furthermore, its advanced safety features and powerful exhaust equipment ensure a safe, contamination-free working environment.