Used CANON / ANELVA SPF-730H #9219102 for sale

CANON / ANELVA SPF-730H is a sputtering equipment designed for thin-film deposition of materials, typically applied in the fields of research and development related to semiconductors, thin films,and nanotechnology. It is a three-source physical vapor deposition (PVD) system that can deposit metal, semiconductor and dielectric thin films on substrates. CANON SPF-730H is made up of three independent, rotating co-magnetrons that allow for the deposition of materials from three sources, and features a rotary encoder attached to the rotator to help optimize the unit. This configuration provides better target utilization, and thus, increases productivity while reducing re-targeting and maintenance costs. Additionally, the machine features a field emission monitor to ensure the film thickness and composition remain consistent during deposition. ANELVA SPF-730H has a dual chamber design, with a main chamber and an auxiliary chamber for multiple applications. The main chamber is vacuum-sealed, and includes two 20cm diameter substrate holders that support substrates up to 200mm in diameter and a rotating yoke for angular sputtering. It is also fitted with a nitrogen supply, allowing reactive sputtering in an atmosphere of up to 0.5 Pa. The auxiliary chamber is equipped with a showerhead feature and microcontroller for controlling the tool parameters. SPF-730H has a load-lock asset that ensures high vacuum quality, as well as an auto-shutter that prevents the exposure of substrates to the vacuum for a long period of time, thus eliminating the need for manual handling. It also has automatic operating temperature control that ensures the temperature stability of the substrates during the deposition process. Additionally, the model is equipped with a computer that controls the entire process, from positioning of the substrates to monitoring the oxygen partial pressure, allowing for precise and repeatable recipes. In conclusion, CANON / ANELVA SPF-730H is a reliable and consistent sputtering equipment that can be used for the deposition of thin-film materials for applications in research and development. Its three-source PVD system and load-lock unit ensure high uniformity and repeatability of the films produced, while its built-in sensors help optimize production rates.