Used CPA / KURDEX XM2000 #9148918 for sale

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CPA / KURDEX XM2000
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ID: 9148918
Sputtering system.
CPA / KURDEX XM2000 Sputtering Equipment is an industrial process used to deposit thin films of metallic and semiconductor materials on a variety of substrates. The machine's main components consist of a high vacuum chamber, vacuum pump, sputtering power supplies, control electronics, and a rotating target for deposition. CPA XM2000 utilizes an energy-efficient magnetically enhanced sputtering process with a low-temperature deposition rate, making it an ideal choice for deposition of metallic, conductive and dielectric materials. KURDEX XM2000 utilizes magnetic-enhanced sputtering, a process that creates a highly intense, evenly distributed 'plasma' containing argon gas and metal ions, allowing for uniform deposition onto many substrates. The process is also quite energy efficient in comparison to traditional sputtering processes, allowing for a cost effective and efficient operation. The system is able to sputter metals onto substrates with excellent surface coverage with no pinholes or other imperfections. XM2000 has advanced features that ensure reliable process repeatability and precise control of the emittance parameters. The unit is equipped with a high-vacuum chamber, high-powered vacuum pump, and individually controlled sputtering power supplies. The sputter power supplies are capable of both DC or multi-pulse sputtering for full control over the deposition process. Each power supply can be independently operated for simultaneous deposition of multiple targets or to ensure repeatable deposition in multiple coatings. The user-friendly control panel allows operators to quickly and easily set the emittance parameters for each sputterpower supply. The machine is also designed to ensure uniform deposition and precise control of the emittance parameters. CPA / KURDEX XM2000 sputtering tool is a reliable and efficient deposition process for use in industrial applications. With its energy-efficient magnetically enhanced sputtering technique, precise control of emittance parameters and reliable operation, it is an excellent choice for deposition of metallic, conductive and dielectric materials onto a variety of substrates. CPA XM2000 can provide operators with repeatable and precise deposition with minimal downtime and cost, aiding in the production of parts with specified emittance characteristics.
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