Used CVC 611 #9160360 for sale

CVC 611 is a multi-target reactive sputtering equipment designed to deposit thin films over large areas with maximum speed and efficiency. It utilizes magnetron sputtering technology and computer-controlled substrate holders to create high-quality thin film properties. 611 sputtering system consists of several components, including a target wheel, frequency converter, magnetron, substrate holder, process chamber, substrate spacer panels, water cooling panel and controllers. The target wheel contains six targets, each with its own frequency converter, enabling multiple sputtering configurations. The frequency converters allow for the fine tuning of power during sputtering. The magnetron is designed to generate high-density plasma, offering an even coating to the substrates. The substrate holder has built-in sensors for temperature and gas pressure control. The process chamber is equipped with refractory materials for sputtering control and ionized gas for plasma control. It also has an evacuation unit with vacuum pumps to increase the sputtering rate. The substrate spacer panels provide a uniform substrate spacing and positioning inside the chamber. The cooling panel uses water to cool down the sputtered substrates and to maintain the chamber temperature. The controllers on CVC 611 allow for precise power application and target timing. 611 sputtering machine is highly versatile and can deposit a variety of thin films over large areas. It provides excellent coverage, precision, speed and efficiency. It is frequently used in advanced photolithography, semiconductor device fabrication, data storage and bioscience industries. CVC 611 is a reliable and robust tool that provides consistent and long-lasting performance.