Used CVC SC 4000 #9106193 for sale

CVC SC 4000 sputtering equipment is a powerful vacuum deposition tool designed for large area coating applications. The system features an advanced three-chamber design that allows for high throughput deposition processes and uniform coating across a large substrate. It utilizes a proprietary magnetron sputtering cathode to provide uniform coating rates and precise layer thickness control for high-quality surface finishes. SC 4000 is designed to provide a stable deposition process over a wide range of temperatures, pressures, and dimensions. The two component chambers of CVC SC 4000 are designed for high deposition rate. The main chamber is outfitted with a quad-column stage with a load/unload robot for easy switching of substrates. This chamber is capable of accommodating up to four substrate wafer sizes, up to 203mm in diameter. In the main chamber, the substrates are held in place by the robot and then are transported to the processing area where uniform thin film deposition can take place. The secondary, "clean" chamber is designed to ensure optimum quality of the films being deposited. It includes a static charge neutralization device, reactive gas delivery systems, and a controlled environment for stable film growth. This chamber also features a removable bell jar for easy access to substrates within the unit. SC 4000 sputtering machine also offers a range of coatings for specific applications. It can produce oxide, nitride, carbon, and metal coatings with a wide variety of techniques. These include conventional sputtering processes as well as plasma-enhanced chemical vapor deposition, or PECVD. CVC SC 4000 sputtering tool is ideal for the highest quality coating applications. With its advanced three-chamber design and full range of techniques available, SC 4000 can provide efficient deposition processes for large area substrates, resulting in uniform and high-quality finished products.