Used DENTON VACUUM DESK II #9114743 for sale

DENTON VACUUM DESK II is a next-generation sputter equipment designed for research and development in the field of vacuum deposition and thin film coating. The system is ideal for depositing high conducting and dielectric thin films, such as oxides, nitrides, carbides, and alloys, with precision and reliability. The unit is equipped with a custom-built multichamber configuration which includes a turbo-molecular pump, a primary vacuum chamber, a process chamber, a e-gun chamber and a filtration chamber. The machine is built to allow for convenient sample loading and unloading. It also consists of an advanced closed-loop process controller, which enables full automation of sequential film sputtering applications. The tool is capable of high-speed sputter deposition with excellent uniformity over large areas up to 42" wide. It is also highly versatile, with the ability to deposit a variety of materials from both elemental and compound targets with a range of substrate mounting configurations. The process controller also features a fifty-programmable recipe memory, which makes it possible to store up to fifty predetermined recipes for future use. The process parameters can be conveniently modified via the intuitive graphical user interface, which includes a wide variety of input/output options and up to six process parameters, including pressure, temperature, substrate bias, target bias, deposition rate, and film thickness. The user-friendly design includes both pre-programmed and user-defined parameters. The asset also features eight direct heaters for substrate and target temperature uniformity and low outgassing rate, as well as two RF substrate bias sources for wide range of process control optimization. Advanced RPM control allows the user to optimize the parameters for both ultra-thin coating films and thick deposits. The model provides advanced optical monitoring via optical emission spectroscopy, allowing the user to thoroughly analyze film deposition rates and adjust the parameters accordingly. Further, a remote service port provides full remote access for database queries, process diagnostics, and tuning. This ensures the process continued efficiency by reducing time and cost associated with an on-site service call. In conclusion, DESK II is an advanced sputtering equipment that provides exceptional film uniformity and accuracy with intuitive graphical user interface and reliable closed-loop process control. Its multichamber configuration enables wide range of process optimization, and its advanced optical monitoring further ensures efficient sputter deposition. The system is ideal for research and development requiring operation with precision, reliability, and low cost of ownership.