Used EVATEC Radiance #9130079 for sale

Name: EVATEC Radiance
Brand: EVATEC
SKU: 9130079
Availability: SoldOut

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Sputtering Systems

Manufacturer

EVATEC

Model

Radiance

ID: 9130079

Vintage: 2010

Sputtering deposition system Load lock and handling system Transfer module Single target Temperature: 10-50 degree C Relative humidity: 30-80% Shared fore line pump: EDWARDS GX100L LL TMC Pump: PFEIFFER TMH261 TC TMC Pump: PFEIFFER TMH521 (2) Batch process modules (BPM) Process chamber Turn table Wafer chucks Shared Fore line pump: EDWARDS GX100L Turbo pump: PFEIFFER Highpace 2301 CTI Inline water pump Chamber conditioning unit Baratron process gas measurement gauge Base pressure: <9E-8 mbar (2) Process sources SSC 300 Planar magnetron SSC300 (1) DC Power supply 5kW (3) Mass flow controllers Rack cabinet Control system Chamber shield for each process module 80-100 A, 50 Hz, 1200 VAC 2010 vintage.

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EVATEC Radiance is a sputtering equipment available from EVATEC, Inc. It is designed to provide high throughput sputtering for the production of thin films. Radiance system utilizes a traditional method of sputtering, utilizing magnetron sputtering with diode and triode sputter configurations. It offers a wide range of rotating and stationary targets for both planar and cylindrical deposition. EVATEC Radiance unit offers the capability of depositing a range of materials, including metals, alloys, oxides, nitrides, and amorphous materials. The temperature range of production is from room temperature to up to 400°C. Radiance machine is capable of depositing all material forms, such as films, multilayers, and vapor dispersed layers. It can also be used to create fine features and nanostructures with limited line and space widths. The tool is suitable for high-aspect ratio depositions and is able to position targets for deposition in a variety of ways. EVATEC Radiance asset also offers advanced sensor technology, which allows for precise control of gas flow in the deposition chamber. This ensures uniform distribution of the gas mixture inside the chamber. The advanced sensing technology also offers temperature sensing capabilities, which allow for precise temperature control in order to create more uniform films. The advanced sensor technology also allows for faster deposition and higher throughput rates. Radiance model also offers remote-control capabilities, which enable users to control and monitor the equipment remotely. This includes monitoring deposition rate, deposition time, and motion control of targets. EVATEC Radiance system is also equipped with human-machine interfaces (HMIs) that are used to set parameters such as operating parameters, target selection, and recipes. Overall, Radiance sputtering unit offers a variety of features and capabilities that make it ideal for thin film production. It is designed for production and research applications, providing users with precise control and great performance.