Used HITACHI E-1020 #9284033 for sale

HITACHI E-1020
Manufacturer
HITACHI
Model
E-1020
ID: 9284033
Ion sputtering system.
HITACHI E-1020 is an advanced sputtering equipment used for deposition of thin films. It features increased deposition speed and more uniformity compared to alternative systems. E-1020 is physically designed to minimize the possibility of arcing between the sputtering target and the substrate holder. This is done by using a specially designed target holder that is insulated to protect against ground loops while also providing an efficient cooling system. This allows for precise control over the deposition process. HITACHI E-1020 also utilizes a low-pressure reaction chamber, allowing sputtering gas molecules to travel at higher rates. This helps to ensure that the substrate holder is kept free of particles that can damage sensitive activity layers. The reaction chamber also reduces the temperature of the sputtering target, even during power deposition. E-1020 is equipped with an automated material dispenser unit, which allows the user to control the thickness and uniformity of the deposited layers. The machine is capable of accurately controlling the power of the sputtering gun, so that precise application layers can be achieved. The sputtering tool is fitted with a robust vacuum chamber, ensuring that a vacuum of over 1E-9 torr can be established. This is important for obtaining superior coating uniformity, a prerequisite for reliable functioning of components. HITACHI E-1020 is also equipped with advanced safety features. It features an automated reaction chamber and target replacement asset, significantly reducing the risk of operator injury. Additionally, it has several safeguards in place to protect against overheating and overvoltage scenarios. Finally, E-1020 is equipped with a range of software and hardware interfaces, making it easy to connect to other systems. This opens up a wide range of applications, such as material template matching and coating thickness testing. HITACHI E-1020 is a versatile and reliable sputtering model. By making use of its advanced features, it is possible to produce cost-effective, superior quality coatings. It is ideal for use in a wide range of industries, from optoelectronics to biomedical.
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