Used HITACHI IML4-1 #9128628 for sale

HITACHI IML4-1 is a state-of-the-art sputtering equipment. This vacuum coater system features an integrated 3-stage turbo-molecular pumping unit integrated into the outer chamber, providing consistent performance over a wide range of operating pressures. This machine enables precise thin film deposition at very low pressures and low temperatures. IML4-1 encompasses an evaporation based deposition tool. This technology uses a powerful magnetron source to locally heat a sample, creating a plasma in order to evaporate atoms that can be used to create thin films. This asset is capable of being rotated for optimized film coverage. HITACHI IML4-1 has the ability to precisely control the rate of evaporation and the deposition rate of atoms over the entire surface of a sample, ensuring uniformity. Furthermore, IML4-1 provides the use of a 300mm circular sputter target. This sputter target can be used to deposit thin films of various metals, such as aluminum, chromium, and titanium, among other materials, with very high deposition rate and uniformity. HITACHI IML4-1 also incorporates a high-energy remote plasma source, which can be used to sputter wide areas of a sample in a short amount of time. Additionally, the model is equipped with an auto-magnetic source, which provides precise control over the deposition profile and film parameters, enabling long-term stability. Finally, IML4-1 is also equipped with a load lock equipment for easy sample loading and unloading. For increased user safety, HITACHI IML4-1 is controlled and monitored by a plasma monitor, as well as a digital leak detector and thermocouple thermometer. In conclusion, IML4-1 is an ultra-high-performance sputtering system that is capable of providing precise thin film deposition with high speed and uniformity. This state-of-the-art unit is easy to operate and maintain and is ideal for a wide range of applications, from research and development to small production runs.