Used KURT J. LESKER PVD 75 #185736 for sale

KURT J. LESKER PVD 75 is a high-performance medium-frequency, single-arc sputtering source equipment. The system features a load-lock chamber, a vacuum transfer chamber, and a main chamber for sputtering. It has a base pressure of 2 x 10-7 Torr and is capable of operating from 1 x 10-3 Tor to 2 x 10-8 Torr. PVD 75 unit consists of a sputtering chamber equipped with an E-Gun and an adjustable target holding fixture. This allows for simultaneous and independent sputtering of multiple targets and substrates. The E-gun is adjustable in height and angle to increase uniformity across the workpiece. The chamber is equipped with four mechanical rotary pumps to achieve ultra-high vacuum levels and four turbo-molecular pumps to reach higher pumping speed and ultimate pressure. KURT J. LESKER PVD 75 is a versatile machine that offers a wide range of coatings. It can be used to deposit ceramic and non-ceramic materials, such as dielectrics, metals, oxides, nitrides, and a variety of conductive and semiconductor materials. The tool is flexible in substrate size and shape, and can accommodate substrates up to 200 x 300 mm. It is also capable of performing sputter cleaning or substrate degassing. PVD 75 is highly reliable and easy to maintain. It offers excellent repeatability of deposition rates and an extended maintenance cycle, which reduces downtime and minimizes the cost of ownership. Additionally, the asset's unique endura-Pro Technology prevents the erosion of electrodes and anodes, extending the lifetime of the E-gun and sputter cathodes. Overall, KURT J. LESKER PVD 75 is an efficient and reliable sputtering model that is suitable for a wide range of deposition and sputter cleaning applications. Its excellent repeatability and long service life reduce cost of ownership and increase productivity.