Used LEYBOLD / BALZERS ZV740 / AZ RFD #9205696 for sale

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LEYBOLD / BALZERS ZV740 / AZ RFD
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ID: 9205696
Sputtering system HF-GN-Anlage steurschrank IS 15/13560
LEYBOLD / BALZERS ZV740 / AZ RFD is a high-performing, advanced physical vapor deposition (PVD) equipment designed for sputtering applications. It combines a wide range of process parameters, coating deposition rates, and materials compatibility. LEYBOLD ZV740 / AZ RFD is suitable for many different types of Thin Film Deposition (TFD) processes. It is designed for use in a variety of industries, including industrial electronics, optoelectronics, and microelectronics, as well as optoelectronic, aerospace, automotive, and medical applications. BALZERS ZV740 / AZ RFD utilizes a 6-axis robotic controlled sputter chamber supported by a Substrate-Clam Shell system. The unit features programmable application rate control and dynamic substrate motion. It also includes a touch panel controller, a chamber viewer camera, and a built-in e-beam monitoring and safety sensor. It adds improved process monitoring capabilities with process variable logging and online data retrieval. The sputter chamber features an advanced process chamber design with out-of-the-box process chamber optimization. It includes an advanced two-part cathode machine, a transformable target clamping tool, a fixed target holder, gas channel access, and a process view camera. The RF/DC and MF/DC power supplies provide stable plasma generation and uniform ion bombardment for improved film adhesion and uniformity on substrates of all kinds. ZV740 / AZ RFD features a range of coatings and substrate materials, from Titanium Nitride (TiN) and Carbon NanoTubes (CNx) to Chromium (Cr) and Titanium (Ti). It has an advanced control logic and automated process control, allowing for real-time performance monitoring. LEYBOLD / BALZERS ZV740 / AZ RFD also features automated load-lock and process chamber pressure control, temperature control, and substrate-to-substrate matching, ensuring uniform coatings and film thickness across all substrates. In addition, LEYBOLD ZV740 / AZ RFD offers various equipment configurations options to accommodate mobility and usage. It has leak detection to alert of any vacuum asset degradation and an integrated reactive etch process to remove native oxides. The RFD also includes an integrated gas management model for efficient and optimized target burning. Ultimately, BALZERS ZV740 / AZ RFD provides a reliable, advanced physical vapor deposition equipment for sputtering applications. Its innovative chamber design, advanced process capabilities, and comprehensive coatings options make it the perfect choice for any industry.
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