Used METRON Eclipse #9077820 for sale

METRON Eclipse is a sputtering equipment designed to deliver high deposition rates with exceptional control and uniformity. The system is a highly efficient PVD layer sputter machine which utilizes a single main chamber with individual rotating platforms, enabling the user to sputter multiple wafers simultaneously. The unit features a unique modular design, allowing it to be easily customized and configured for a wide variety of applications. Eclipse is capable of providing high deposition rates at relatively low pressure without sacrificing quality or uniformity. METRON Eclipse is based on the design of a cathodic arc PVD, with the addition of a rotating machine to enable layer deposition to be performed on multiple wafers simultaneously. The tool is equipped with an automated load/unload asset, which allows users to quickly and easily move wafers from one location to another. Eclipse uses a direct current and variable power supply to sputter a variety of materials with various compositions, sizes, and shapes. METRON Eclipse is well-suited to layers of copper, titanium, nickel, cobalt, and aluminum, as these materials have the greatest resistance to sputtering. The model utilizes a high efficiency, uniform deposition technique to ensure uniform layer coverage over the entire surface area of the wafer. Eclipse supports a wide range of deposition technologies such as ion beam, rotation, and radio frequency plasma. An integrated chamber heating/cooling equipment ensures that the sputtering temperature is correctly maintained, and the introduction of a sputtering gas is possible. The system is equipped with an integrated cooling unit with an adjustable temperature range from 0-50°C, allowing users to keep their coolant temperature at an ideal level. The chamber's pressure can be adjusted from 0.1 mbar to 6 mbar and the user has the ability to easily control the current, voltage, gas pressure, and flow rate. METRON Eclipse has an easy-to-use graphical user interface for setting up and monitoring the sputtering process. The machine offers high deposition rate compatibility, with a 1:1 aspect ratio sputter rate of 250 nm/min and a 2:1 aspect ratio of 155 nm/min. The deposit rate for a 4:1 aspect ratio is 105 nm/min, and for a 5:1 aspect ratio, it is 48 nm/min. Eclipse provides the user with the highest control in terms of plasma stability and uniformity, offering tight control ranges and uniformity for continuous sputter processes. Furthermore, the tool is designed to produce better results than DC sputter techniques, yielding increased film density and better adhesion. Overall, METRON Eclipse is an ideal sputtering asset for the fabrication of layers with superior uniformity and deposition characteristics. It is an efficient, safe, and reliable machine that is easy to set up and operate, ideal for a variety of sputtering applications. The model's high deposition rate and uniformity makes it suitable for small-scale production and research laboratory applications.