Used MRC 600 #9248407 for sale

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MRC 600
Sold
Manufacturer
MRC
Model
600
ID: 9248407
Wafer Size: 6"
Sputtering systems, 6".
MRC 600 is a type of sputtering equipment that is used to deposit thin films on various substrates. This type of deposition process involves ionizing a gas and accelerating it towards a target material to eject atoms of that material and form a thin film on the substrate. This type of system is often used in the semiconductor industry as well as in other industries such as optics and data storage. 600 is a vacuum sputtering unit that is able to achieve high quality deposition of films in the range of 10 to 1000 nanometers. It is built with a stainless steel chamber that is able to achieve a vacuum of 1 x 10-6 torr by mechanical and turbo molecular pumps. It is powered by 8 isolatable DC planar magnetrons, allowing for the optimization of sputtering conditions. The chamber is constructed with a conically-shaped target design and includes an integrated substrate rotation and substrate heaters, both of which are used to achieve uniform coating. The machine is equipped with several electrical components and useful features such as a video display, remote electronic control, and a power failure alarm. MRC 600 is a reliable tool that is simple to operate and allows for rapid and flexible production processes. It is capable of both batch and continuous deposition, with a loadlock available as an optional extra. This asset is best suited for the deposition of dielectric, conductive, and optical films. It is also equipped with a closed loop RF power supply for uniform thin film coatings and an argon injection model for improved performance. In conclusion, 600 is a reliable and efficient sputtering equipment that is perfect for users looking to efficiently deposit thin films on various substrates such as in the semiconductor and optical industries. It is equipped with features and components that allow for enhanced and uniform deposition of films, thus enabling its users to achieve high quality results.
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