Used MRC 603 #166010 for sale

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Manufacturer
MRC
Model
603
ID: 166010
Sputtering system Control ranges: Sputtering pressure: 3 min, 25 max millitorr Scan speed: 2 min, 400 max cm/min DC Sput: 300 min, 9999 max watts RF Sput: 0.02 min, 2.5 max kV, 0.1 min, 1.5 max kW RF Etch: 0.2 min, 1.5 max kV, 0.1 min, 1.5 max kW Heat at etch station: 10 min, 18 max Amps Vacuum loadlock: Ultimate: 50 milliTorr Pumpdown time: 50 milliTorr within 2 min.
MRC 603 is a high-performance, multi-source sputtering equipment that is widely used for physical vapour deposition of thin film materials. It enables simultaneous sputtering of up to three targets of different materials. The targets for sputtering are constrained in a specially designed chamber and the sources of sputtered material are fed from a radio frequency or direct current electron guns. A powerful and computer-controlled rotary platform allows for rapid rotation of all three targets, as well as accurate delivery of the predetermined dose of material to be sputtered. The system is composed of a special shielding chamber, a powerful sputter source, turntable, cooling unit, and the main power supply. The source chamber is designed to prevent any outgassing, dust, particles, and condensation. It is also designed with a diffuser to minimize sputtered material being trapped in the space between the chamber and substrate. The sputter source can be configured to operate at both DC and RF frequencies, and can be adapted to different anode configurations along with additional special components according to the experiment requirements. A high-powered rotary platform ensures that all components inside the chamber rotate and are in the optimal position for the experiments. 603 also includes a cooling machine that helps to manage temperature increases during operation. It is composed of two independent cooling circuits, one for the sputter source and one for the rest of the tool. The cooling asset includes fans that are adjustable in speed, as well as several flow meters and temperature sensors. The main power supply for MRC 603 is a state of the art industrial grade unit with a wide range of current and voltage settings. This power supply can support load currents up to 10kW and ensures smooth and accurate delivery of power to the source and other components. For control and data logging, 603 can be connected to a computer through USB or Ethernet connection. It comes with a special dedicated control software package that provides users with a wide range of parameter settings and graphical display. Overall, MRC 603 sputtering model provides researchers with an all-in-one sputtering solution that is robust, reliable, and convenient to use. It enables researchers to easily experiment with different types of thin film materials and allows for accurate control over the sputtering process.
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