Used MRC 603 #9219234 for sale

MRC 603 is a state-of-the-art, small-scale sputtering equipment for research and development applications. It can be used for the deposition of thin films with exceptional uniformity and superior process control. The system consists of an ultra-high-vacuum load-lock chamber, an in-vacuum nonmagnetic rotatable sputtering target, personal computer control (located in a 3x5' operator's console), and an inert gas supply. The sputtering chamber, with a high-voltage power supply and controller, is used for film deposition. The chamber accommodates a variety of sputtering sources, including magnetron and radio frequency (RF) sources. The sputter target is installed inside the chamber and is rotatable in order to minimize film thickness variation, which ensures uniform deposition on both sides of a substrate sample. The unit utilizes a single-pass, closed-loop electron beam evaporation and direct sputtering from a periodically alternating source. This allows for faster deposition times while providing the highest quality thin films. The substrate sample is held in place by a three-axis vacuum stage and can be adjusted in x-y-z planes before sputtering. After the film is deposited, the sample can be transferred into a cooling chamber in order to rapidly cool it down. The machine is equipped with advanced process control and monitoring features that provide process repeatability and adjustable parameters to increase production yields. It utilizes a closed-loop feedback tool which monitors the sputter rate of target material, temperature, pressure, and gas flow in order to maintain process parameters. 603 enables users to deposit uniform, controllable, high-quality thin films in a small sputtering asset. It is an efficient and reliable tool that can be used for deposition of a wide range of materials for different types of projects. It offers superior process control and repeatability, which makes it suitable for both highly specialized research and development applications.