Used MRC 643 #9035812 for sale

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MRC 643
Sold
Manufacturer
MRC
Model
643
ID: 9035812
Sputtering system (2) cryo pumps, (2) 13"x13" cathodes targets and (1) blank target (1) Alumnium cathode, (1) Titanium, (1) blank RF Power Supply and DC Generator 208 V, 100 A, 50 Hz, 3 Ph Chamber still under vacuum MRC 8080 Microprocessor controller Pumps down to 10^-7 Torr.
MRC 643 is a state of the art sputtering equipment equipped with several advanced features that can be used for a range of applications. The system utilizes the magnetron sputtering technique and can deposit coating on both semi and non-conductive substrates. The unit consists of two chambers, which allows for the sputtering of two different targets at the same time. The chamber size is adjustable, enabling materials with varying sizes to be deposited. 643 includes a levitation control machine to provide uniformity of the deposition, and has been proven to achieve unprecedented thin film coatings on delicate surfaces. The tool is equipped with an RF power supply, providing a wide range of power output and an optimized power source for sputtering various targets. This RF power supply allows for increased deposition rates, improved uniformity, and increased efficiency. Additionally, the asset can have a choice of three different process gases to achieve different types of deposition, such as PVD, PECVD and magnetron sputtering. MRC 643 also features multiple substrates per process, allowing for increased throughput. This makes the model ideal for large scale production. For precision applications, 643 offers TIR (Total Internal Reflection) X-ray diffraction capability for easy determination of the film thickness. Finally, the equipment includes software and hardware for remote monitoring of deposition processes, motion control and precision robotic end effectors. This allows for increased automation and helps to reduce costs associated with manual setup and operation. In conclusion, MRC 643 is an advanced sputtering system that offers an unparalleled level of accuracy and performance. It is highly customizable and ideal for a range of applications, making it a perfect choice for any company looking for reliable and cost-effective sputtering technologies.
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