Used MRC 662 #9248278 for sale

MRC 662 is a sputtering system designed for high rate ion beam deposition (HRID) of thin film coatings. It uses a field emission (FE) gun source to generate positively-charged ions which travel through a reaction chamber and coat a target surface in the form of a thin film. 662 is capable of depositing materials at rates up to 3-4 angstroms per second and can be used for both in-situ and ex-situ deposition processes. MRC 662 features a configurable deposition chamber with a wide range of parameters, including customizable pressure and temperature controls. It can be adjusted to provide a variety of processes, such as physical vapor deposition (PVD), magnetron sputtering, or reactive sputtering of targets. The reactive sputtering process is often used in the production of magnetic storage media and produces a coating with good corrosion resistance and a high level of oxidation resistance. 662 also features several options for data collection and analysis. It can be outfitted with a sample holder that can be used for in-situ and ex-situ analysis, allowing for the characterization of the substrate/target sputtered thin film coatings. It can also be used to measure the electrical and magnetic properties of the substrate and the deposited film. MRC 662 is an advanced sputtering system with the ability to deposit thin films of various materials and thicknesses in a controlled and recursive manner. It utilizes a FE gun which has greater ion-emission stability than other sputtering systems. 662 is manufactured by Mitsubishi Electric Corporation and is used widely in the electronics industry for the deposition of thin films onto substrates.