Used MRC 662 #9265336 for sale

MRC 662 is a powerful and flexible sputter deposition system designed for a wide range of research and industrial applications. It is a compact vacuum process chamber designed for ultra-high precision thin film and metal coating. The chamber is maintained at a low pressure state in order to avoid oxidation of the deposited materials during the sputtering process. The system uses an arc-type cathode that combines powerful ion bombardment with uniform sputter deposition. This enables a high deposition rate while providing excellent uniformity of the coatings. The chamber is a multi-lamp, all quartz construction with a circular pattern of 8 RF antennas. It offers process uniformity with an adjustable process enclosure that is designed for maximum flexibility. The adjustable cavity blowers ensure low secondary electron emission and deposition homogeneity. The chamber also features an integrated movable target positioner with independent lift and rotation. This allows for recipe control of various targets, all without breaking vacuum. Other features include an integrated measurement and diagnostics module for monitoring the process parameters and a fully automated robotic ejector for sample transfer. 662 also includes an access port to enable internal as well as external electrode fabrication and offers excellent laser marking capabilities. It is also compatible with many gas controllers for a wide range of coatings and surface treatments. Overall, MRC 662 automated sputter deposition system is an optimal choice for a wide range of thin film deposition applications. It offers powerful yet highly precise thin film and metal coating for research and industrial applications. Its powerful features include adjustable process chamber for uniformity, a movable target positioner, integrated diagnostic module, and a robotic ejector for sample transfer. Its flexibility and convenience make it an ideal choice for any researcher or manufacturer looking to improve their coating process.