Used MRC 8667-A #9060240 for sale

MRC 8667-A is a state-of-the-art sputtering equipment (SPS) designed for deposition of a variety of materials. The system has features such as low temperature, low voltage and low operating costs, allowing for greater control and higher yield of desired material deposition. It is equipped with two magnetrons, allowing it to process both planar and non-planar substrates. The two independent magnetrons are operated independently or in combination, enabling a wide range of coating structures and processes. The unit is composed of two sets of independent power supplies, a vacuum chamber, and a base station. It is designed for easy maintenance and operation. The base station provides a full range of software and hardware components for controlling the machine and monitoring deposition processes. The power supplies provide precise control over substrate deposition parameters, including current, voltage, substrate temperature and substrate shielding. The high voltage and low voltage power supply tool allows for independent control of each magnetron. The vacuum chamber of the asset is made up of two parallel processors, a high frequency generator (HFG) and a high power generator (HPG). These two generators enable faster and more efficient deposition processes. The HFG generates short duration high-frequency bursts, while the HPG generates low-frequency sustained voltages. Both generate plasma in the vacuum chamber at low pressures to achieve better process control and uniformity. For deposition, 8667-A has an advanced vacuum model. Sputter targets are mounted to a rotating platform, where their angle and position can be adjusted for optimum material supply. Additionally, the DC model includes a rotating substrate holder. This enables optimization of the material supply to a substrate surface and increases the uniformity and repeatability of the deposition process. The equipment also has advanced features such as an auto-calibration system, which monitors process conditions and can be used to adjust the film thickness, conductance and stress within the deposited films. This helps ensure the highest quality of films, using either direct or remote monitoring. The unit also has a target mapping machine, which helps to ensure uniform film thickness and distribution over large substrates. The tool is ideal for applications requiring low temperature and low voltage and allows for multiple processes to be performed in a single run. The integrated control asset permits real-time model control and allows for equipment to be operated in either manual or automated mode. It also allows for efficient data storage and retrieval. Overall, MRC 8667-A is a powerful and versatile sputtering equipment. It has advanced features that increase the quality and repeatability of depositions, and provides greater control over the deposition process. With its ease of operation and low operating costs, the system is an ideal choice for a variety of deposition needs.