Used MRC 8800 #153604 for sale

MRC 8800 is a fully-integrated sputtering equipment ideal for advanced Web Coating and Precision Coating applications. This system features a high-powered direct current (DC) magnetron sputtering source, with a robust, modular architecture that enables the precise delivery of deposition material to substrates. It offers high ionization density, enabling precise control of deposit geometries and coating uniformity on a wide range of substrates. The unit allows substrates to be mounted in multiple configurations, enabling precise delivery of the metal layer, even on substrates with complex shapes. Furthermore, the machine is equipped with a lift-out tray and in-situ substrate spinning mechanisms to enable fast substrate loading and removal. The control module of 8800 is equipped with a user-friendly graphical user interface that offers easy access to process parameter setup. It also provides accurate monitoring and control of processes, with a range of sputtering parameters customizable to ensure consistent and reproducible results. Advanced programming capabilities allow for complex, multi-layer processing setups, with the ability to change parameters in real-time to maintain process consistency. The tool also supports multiple process techniques such as ion-beam assisted deposition and ion-beam etching, to optimize coating features. In addition, MRC 8800 has sophisticated power supply design to ensure low-temperature sputter operation and improved process uniformity. It also includes a temperature controlled vacuum load-lock for precise substrate transport and processing conditions. 8800 is also equipped with a high-efficiency gas flow control chamber for precise process gas composition control. In summary, MRC 8800 is a powerful, modular sputtering asset that is designed for precise Web Coating and Precision Coating applications. It enables exact control of deposition material to substrates, with fast substrate loading and removal, and a user-friendly, real-time parameter adjustment interface. Furthermore, the temperature controlled vacuum load-lock and advanced power supply design ensure consistent process performance, which further contribute to excellent coating uniformity and reproducibility.