Used MRC 8800 #9199419 for sale

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Manufacturer
MRC
Model
8800
ID: 9199419
Turret sputtering system 6 Face Not included: Vacuum pumps Targets or RF generator Chamber inside dimensions: 26.5" wide x 32" high.
MRC 8800 is a computer-controlled sputtering equipment with stationary targets for precision uniform coating. It is an advanced ion source deposition technology used to apply thin films of metal, dielectric or protective layers onto a variety of substrates, ranging from highly curved 3D parts to flat surfaces. 8800 system has a large gas chamber, in which a stable, micro-controlled arcing process is created, as well as an independent gauge in which competitive pressures of up to 5 torr can be maintained. Through its layered deposition structures, this sputtering unit is known to deliver highly uniform coatings. The machine is outfitted with a user-friendly, 10" touchscreen panel, which offers several operation modes like uniform coating, position control and programmable processes. It also supports up to 5 substrates which can be accurately positioned under the ion source for deposition. Additionally, the tool includes a high-tech magnet that ensures higher deposition uniformity and increased material utilization rates. MRC 8800 sputtering asset includes an automated furnace that can accommodate various substrate sizes and can accommodate substrates stored in a cassette. This allows users to set parameters for temperature, pressure, time, and other specifications for uniform coating. To ensure accurate deposition, the model also comes with a vacuum chamber for consuming residual gases and an exhaust chamber to help maintain process purity. 8800 equipment is designed to provide superior process control and consistent coating performance. Its low-voltage arc and real-time ion current monitoring maintains an optimal energy balance and prevents sputtering particles from escaping. Moreover, the system is certified for ESD guidelines, ensuring safe handling and operation. Overall, MRC 8800 sputtering unit offers superior control and uniformity with consistent coating performance for a wide range of substrates. Its advanced ion source deposition technology and adjustable parameters make the machine a reliable choice for numerous applications.
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